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1

Design of a positive resist for projection lithography in the mid-UV

Grant Willson, Robert Miller, Dennis McKean, Nicholas Clecak, Terry Tompkins, Donald Hofer, Josef Michl, John Downing

Journal:

Polymer Engineering & Science

Year:

1983

Language:

english

File:

PDF, 663 KB

english, 1983

2

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Thick film photoresist resolution enhancement with surfactant surface treatment

McKean, Dennis R., Russell, Thomas P., Renaldo, Alfred F., Allen, Robert D.

Year:

1995

Language:

english

File:

PDF, 654 KB

english, 1995

3

Letters to the Editor

Dennis V. Lindley, W. Scott Overton, Stephen V. Stehman, A. S. Hedayat, Bruno D. Zumbo, Donald W. Zimmerman, Joseph W. McKean, Thomas J. Vidmar, Dan C. Stone, Robert B. Ilderton, Lee R. Abramson, Paul

Journal:

The American Statistician

Year:

1996

Language:

english

File:

PDF, 1.02 MB

english, 1996

4

Author Correction: Elevated faecal 12,13-diHOME concentration in neonates at high risk for asthma is produced by gut bacteria and impedes immune tolerance

Levan, Sophia R., Stamnes, Kelsey A., Lin, Din L., Panzer, Ariane R., Fukui, Elle, McCauley, Kathryn, Fujimura, Kei E., McKean, Michelle, Ownby, Dennis R., Zoratti, Edward M., Boushey, Homer A., Caban

Journal:

Nature Microbiology

Year:

2019

File:

PDF, 532 KB

2019

5

Phenotypic changes associated with deletion and overexpression of a stage-regulated gene family in Leishmania

Paul G. McKean, Paul W. Denny, Ellen Knuepfer, Jane K. Keen, Deborah F. Smith

Journal:

Cellular Microbiology

Year:

2001

Language:

english

File:

PDF, 843 KB

english, 2001

6

Acid photogeneration from sulfonium salts in solid polymer matrices

Dennis R. McKean, Ulrich Schaedeli, Scott A. MacDonald

Journal:

Journal of Polymer Science Part A: Polymer Chemistry

Year:

1989

Language:

english

File:

PDF, 501 KB

english, 1989

7

The effect of polymer structure on the efficiency of acid generation from triarylsulfonium salts

Dennis R. McKean, Ulrich P. Schaedeli, Paul H. Kasai, Scott A. Macdonald

Journal:

Journal of Polymer Science Part A: Polymer Chemistry

Year:

1991

Language:

english

File:

PDF, 665 KB

english, 1991

8

Ring opening of cyclopropyl ketones by trimethylsilyl iodide

Miller, Robert D., McKean, Dennis R.

Journal:

Journal of Organic Chemistry

Year:

1981

Language:

english

File:

PDF, 429 KB

english, 1981

9

Approaches to the synthesis of the insect juvenile hormone analog ethyl 3,7,11-trimethyl-2,4-dodecadienoate and its photochemistry

Henrick, Clive A., Willy, W. Edward, McKean, Dennis R., Baggiolini, Enrico, Siddall, John B.

Journal:

Journal of Organic Chemistry

Year:

1975

Language:

english

File:

PDF, 1.07 MB

english, 1975

10

Synthesis and Properties of Diazopiperidiones for Use in Nonchemically Amplified Deep UV Photoresists

Tattersall, Peter I., Breslin, David, Grayson, Scott M., Heath, William H., Lou, Kathleen, McAdams, Christopher L., McKean, Dennis, Rathsack, Benjamen M., Willson, C. Grant

Journal:

Chemistry of Materials

Year:

2004

Language:

english

File:

PDF, 111 KB

english, 2004

11

Characterization of a Novolak-based three-component deep-UV resist

McKean, Dennis R., MacDonald, Scott A., Johnson, Robert D., Clecak, Nicholas J., Willson, C. Grant

Journal:

Chemistry of Materials

Year:

1990

Language:

english

File:

PDF, 1.55 MB

english, 1990

12

Methylated poly(4-hydroxystyrene): A new resin for deep-ultraviolet resist application

McKean, Dennis R.

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

1990

Language:

english

File:

PDF, 683 KB

english, 1990

13

SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Acid generation and acid diffusion in photoresist films

McKean, Dennis R., Allen, Robert D., Kasai, Paul H., Schaedeli, Ulrich P., MacDonald, Scott A., Novembre, Anthony E.

Year:

1992

Language:

english

File:

PDF, 856 KB

english, 1992

14

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Lithographic performance of a positive photoresist for thick-film applications

Renaldo, Alfred F., Lauchlan, Laurie J., Hofer, Donald C., Hinsberg, William D., McKean, Dennis R., Santini, Hugo A., Willson, C. Grant, Allen, Robert D.

Year:

1995

Language:

english

File:

PDF, 1.18 MB

english, 1995

15

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Base-catalyzed photosensitive polyimide

McKean, Dennis R., Wallraff, Gregory M., Volksen, Willi, Hacker, Nigel P., Sanchez, Martha I., Labadie, Jeff W., Hinsberg, William D.

Year:

1993

Language:

english

File:

PDF, 885 KB

english, 1993

16

SPIE Proceedings [SPIE Microlithography Conference - Santa Clara, CA (Monday 2 March 1987)] Advances in Resist Technology and Processing IV - New Diazoketone Dissolution Inhibitors For Deep U.V. Photolithography

Willson, C.Grant, Miller, Robert D., McKean, Dennis R., Pederson, Lester A., Bowden, Murrae J.

Year:

1987

Language:

english

File:

PDF, 5.84 MB

english, 1987

17

SPIE Proceedings [SPIE San Diego, '91, San Diego, CA - San Diego, CA (Sunday 21 July 1991)] Photopolymer Device Physics, Chemistry, and Applications II - Polymer effects on the photochemistry of triarylsulfonium salts

McKean, Dennis R., Allen, Robert D., Kasai, Paul H., MacDonald, Scott A., Lessard, Roger A.

Year:

1991

Language:

english

File:

PDF, 447 KB

english, 1991

18

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Modified polyhydroxystyrenes as matrix resins for dissolution inhibition type photoresists

Pawlowski, Georg, Sauer, Thomas P., Dammel, Ralph R., Gordon, Douglas J., Hinsberg, William D., McKean, Dennis R., Lindley, Charlet R., Merrem, Hans-Joachim, Roeschert, Heinz, Vicari, Richard, Willson

Year:

1990

Language:

english

File:

PDF, 964 KB

english, 1990

19

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Highly etch resistant, negative resist for deep-UV and electron beam lithography

McKean, Dennis R., Clecak, Nicholas J., Pederson, Sr., Lester A., Watts, Michael P. C.

Year:

1990

Language:

english

File:

PDF, 839 KB

english, 1990

20

SPIE Proceedings [SPIE 1988 Microlithography Conferences - Santa Clara, CA (Wednesday 2 March 1988)] Advances in Resist Technology and Processing V - Novolac Based Deep-UV Resists

McKean, Dennis R., MacDonald, Scott A., Clecak, Nicholas J., Willson, C. Grant, MacDonald, Scott A.

Year:

1988

Language:

english

File:

PDF, 3.61 MB

english, 1988

21

Letters to the Editor

Jean D. Gibbons, David Rothman, Alvah C. Bittner, Jr., Paul I. Feder, Peter Bryant, Patrick E. O'Neil, Roy L. Streit, Harlley E. McKean, Frederick L. Newman, Dennis L. Young, P. S. Levy, S. H. Rosenbe

Journal:

The American Statistician

Year:

1974

Language:

english

File:

PDF, 970 KB

english, 1974

22

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Rational design of bleachable nonchemically amplified DUV photoactive compounds

Rathsack, Benjamen M., Houlihan, Francis M., Tattersall, Peter I., Tabery, Cyrus E., Lou, Kathleen, Stachowiak, Timothy B., Medeiros, David R., Albelo, Jeff A., Pirogovsky, Peter Y., McKean, Dennis R.

Year:

2001

Language:

english

File:

PDF, 1.35 MB

english, 2001

23

Functional analysis of Leishmania stage-regulated proteins

Smith, DF, Denny, PW, Keen, JK, Knuepfer, E, Ma, S, McKean, PG

Journal:

Biochemical Society Transactions

Year:

2000

Language:

english

File:

PDF, 141 KB

english, 2000

24

Conversion of Alkyl Chlorides to Bromides, Selective Reactions of Mixed Bromochloroalkanes, and Halogen Exchange

Willy, W. Edward, McKean, Dennis R., Garcia, Barbara A.

Journal:

Bulletin of the Chemical Society of Japan

Year:

1976

File:

PDF, 1.05 MB

1976

25

Photoacid generation in polymeric films.

MacDonald, Scott A., McKean, Dennis R.

Journal:

Journal of Photopolymer Science and Technology

Year:

1990

Language:

english

File:

PDF, 401 KB

english, 1990

26

ChemInform Abstract: CONVERSION OF ALKYL CHLORIDES TO BROMIDES, SELECTIVE REACTIONS OF MIXED BROMOCHLOROALKANES, AND HALOGEN EXCHANGE

WILLY, W. EDWARD, MCKEAN, DENNIS R., GARCIA, BARBARA A.

Journal:

Chemischer Informationsdienst

Year:

1976

Language:

german

File:

PDF, 252 KB

german, 1976

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